Your selections:
Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography
- Ghalehbeygi, Omid T., O'Connor, John, Routley, Ben S., Fleming, Andrew J.
A nonlinear programming approach to exposure optimization in scanning laser lithography
- Fleming, Andrew J., Wills, Adrian, Ghalehbeygi, Omid T., Routley, Ben, Ninness, Brett
Exposure optimization in scanning laser lithography
- Fleming, Andrew J., Wills, Adrian G., Routley, Ben S.
Optimization and simulation of exposure pattern for scanning laser lithography
- Ghalehbeygi, Omid T., Berriman, Garth, Fleming, Andrew J., Holdsworth, John L.
- Cotton, Daniel V., Fell, Christopher J., Belcher, Warwick J., Dastoor, Paul C.
Scanning probe microscopy for silicon device fabrication
- Simmons, M. Y., Ruess, F. J., Reusch, T. C. G., Goh, K. E. J., Hallam, T., Schofield, S. R., Oberbeck, L., Curson, N. J., Hamilton, A. R., Butcher, M. J., Clark, R. G.
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