- Title
- NiO thin film with an extremely high index (714) on r-plane sapphire substrate
- Creator
- Ding, Xiang; Sathish, C. I.; Yi, Jiabao; Qu, Jiangtao; Zheng, Rongkun; Geng, Xun; Guan, Xinwei; Yu, Xiaojiang; Breese, Mark B. H.; Qiao, Liang; Suzuki, Kiyonori
- Relation
- Emergent Materials Vol. 6, p. 1623-1630
- Publisher Link
- http://dx.doi.org/10.1007/s42247-023-00543-7
- Publisher
- Springer
- Resource Type
- journal article
- Date
- 2023
- Description
- Thin film epitaxy is essential for state-of-the-art semiconductor applications. The combination of different substrates and deposition methods leads to various crystallographic orientation relationships between thin films and substrates, which have a decisive impact on thin film performance. By utilizing pulsed laser deposition, we discovered a very high-index (714) - oriented NiO thin film when deposited on r-plane (1012) sapphire substrates. The in-plane epitaxial relations are [131] NiO||[1210] Sapphire and [112] NiO||[1011] Sapphire, and the lattice mismatch is 3.2% and 0.4% along two directions, respectively. Exchange bias studies by the deposition of Co on NiO (111) and NiO (714) show different behaviors, which may be associated with the spin density and alignment on the surface.
- Subject
- NiO; R-plane sapphire; high index; epitaxy; exchange bias
- Identifier
- http://hdl.handle.net/1959.13/1494790
- Identifier
- uon:53883
- Identifier
- ISSN:2522-5731
- Rights
- This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
- Language
- eng
- Full Text
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