- Title
- Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography
- Creator
- Ghalehbeygi, Omid T.; O'Connor, John; Routley, Ben S.; Fleming, Andrew J.
- Relation
- 2018 Annual American Control Conference (ACC). Proceedings of 2018 Annual American Control Conference (ACC) (Milwaukee, Wisconsin 27-29 June, 2018) p. 6684-6689
- Relation
- ARC.DP120100487 http://purl.org/au-research/grants/arc/DP120100487 & DP150103521 http://purl.org/au-research/grants/arc/DP150103521 & FT130100543 http://purl.org/au-research/grants/arc/FT130100543
- Publisher Link
- http://dx.doi.org/10.23919/ACC.2018.8431550
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Resource Type
- conference paper
- Date
- 2018
- Description
- Laser scanning lithography is a maskless method for exposing photoresist during semiconductor manufacturing. In this method, the power of a focused beam is modulated while scanning the photoresist. This article describes an iterative deconvolution method for determining the exposure pattern. This approach is computationally efficient as there is no gradient calculation. Simulations demonstrate the accurate fabrication of a feature with sub-wavelength geometry.
- Subject
- lithography; laser beams; resists; deconvolution; iterative methods; convolution
- Identifier
- http://hdl.handle.net/1959.13/1459076
- Identifier
- uon:45572
- Identifier
- ISBN:9781538654286
- Language
- eng
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