Erratum: investigation of the photochemistry of the poly {p-phenylenevinylene} precursor system: implications for nanolithography [J. Chem. Phys. 126, 174703 (2007)]

Title: Erratum: investigation of the photochemistry of the poly {p-phenylenevinylene} precursor system: implications for nanolithography [J. Chem. Phys. 126, 174703 (2007)]
Creator: Cotton, D. V.; Fell, C. J.; Belcher, W. J.; Tachiya, M.; Dastoor, P. C.
Relation: Journal of Chemical Physics Vol. 128, Issue 4
Relation: http://jcp.aip.org/jcp/about/about_the_journal
Publisher: American Institute of Physics
Resource Type: journal article
Date: 2008
Description: The photochemistry of the poly{p-phenylenevinylene} precursor system was investigated. The original model for precursor insolubilization did not account for the fact that the number of precursor sites is a function of the dose received. The number of precursor sites converted per unit time at time is proportional to the number of unconverted precursor sites remaining at time and the dose rate. Profilometer data show that under atmospheric conditions T is a maximum. The threshold dose for the atmospheric data will always be greater than that for the precursor irradiated in nitrogen because precursor sites may be oxidized as soon as they have been insolubilized, and hence it takes longer to achieve the threshold of sites required for insolubilization of the polymer.
Subject: photochemistry; nanolithography; precursor insolubilization
Identifier: http://hdl.handle.net/1959.13/38753
Identifier: uon:4356
Identifier: ISSN:0021-9606
Language: eng
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