Scanning laser lithography with constrained quadratic exposure optimization

Title: Scanning laser lithography with constrained quadratic exposure optimization
Creator: Fleming, Andrew J.; Ghalehbeygi, Omid T.; Routley, Ben S.; Wills, Adrian G.
Relation: ARC.DP150103521 http://purl.org/au-research/grants/arc/DP150103521
Relation: IEEE Transactions on Control Systems Technology Vol. 27, Issue 5, p. 2221-2228
Publisher Link: http://dx.doi.org/10.1109/TCST.2018.2836910
Publisher: Institute of Electrical and Electronics Engineers (IEEE)
Resource Type: journal article
Date: 2019
Description: Scanning laser lithography is a maskless lithography method for selectively exposing features on a film of photoresist. A set of exposure positions and beam energies are required to optimally reproduce the desired feature pattern. The task of determining the exposure energies is inherently nonlinear due to the photoresist model and the requirement for only positive energy. In this brief, a nonlinear programming approach is employed to find an optimal exposure profile that minimizes the feature error and total exposure energy. This method is demonstrated experimentally to create a feature with subwavelength geometry.
Subject: gradient methods; integrated circuit manufacture; nanolithography; quadratic programming
Identifier: http://hdl.handle.net/1959.13/1443230
Identifier: uon:41922
Identifier: ISSN:1063-6536
Language: eng
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