- Title
- Unlocking new contrast in a scanning helium microscope
- Creator
- Barr, M.; Fahy, A.; Martens, J.; Jardine, A. P.; Ward, D. J.; Ellis, J.; Allison, W.; Dastoor, P. C.
- Relation
- ARC.DP08831308 http://purl.org/au-research/grants/arc/DP0881308
- Relation
- Nature Communications Vol. 7, no. 10189
- Publisher Link
- http://dx.doi.org/10.1038/ncomms10189
- Publisher
- Nature Publishing Group
- Resource Type
- journal article
- Date
- 2016
- Description
- Delicate structures (such as biological samples, organic films for polymer electronics and adsorbate layers) suffer degradation under the energetic probes of traditional microscopies. Furthermore, the charged nature of these probes presents difficulties when imaging with electric or magnetic fields, or for insulating materials where the addition of a conductive coating is not desirable. Scanning helium microscopy is able to image such structures completely non-destructively by taking advantage of a neutral helium beam as a chemically, electrically and magnetically inert probe of the sample surface. Here we present scanning helium micrographs demonstrating image contrast arising from a range of mechanisms including, for the first time, chemical contrast observed from a series of metal-semiconductor interfaces. The ability of scanning helium microscopy to distinguish between materials without the risk of damage makes it ideal for investigating a wide range of systems.
- Subject
- applied physics; microscopy; nanoscience and technology
- Identifier
- http://hdl.handle.net/1959.13/1343262
- Identifier
- uon:29116
- Identifier
- ISSN:2041-1723
- Rights
- This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/license/by/4.0/
- Language
- eng
- Full Text
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