- Title
- A nonlinear programming approach to exposure optimization in scanning laser lithography
- Creator
- Fleming, Andrew J.; Wills, Adrian; Ghalehbeygi, Omid T.; Routley, Ben; Ninness, Brett
- Relation
- 2016 American Control Conference (ACC 2016). Proceedings of the 2016 American Control Conference (Boston, MA 6-8 July, 2016) p. 5811-5816
- Publisher Link
- http://dx.doi.org/10.1109/ACC.2016.7526580
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Resource Type
- conference paper
- Date
- 2016
- Description
- Laser scanning lithography is a maskless method for exposing films of photoresist during semiconductor manufacturing. In this method a focused beam is scanned over a surface with varying intensity to create features in the photoresist. Given the shape of a desired feature, an exposure pattern must be found that approximates this shape in the developed photoresist. This can be cast as an optimization problem, which is complicated by the non-negative nature of the exposure function and the non-linear photochemistry of the film. In this article, a nonlinear programming approach is described that results in a tractable optimization problem which accounts for all of the practical constraints encountered in laser scanning lithography.
- Subject
- resists; laser beams; optimization; lithography; mathematical model; predictive models; programming
- Identifier
- http://hdl.handle.net/1959.13/1340733
- Identifier
- uon:28560
- Identifier
- ISBN:9781467386821
- Language
- eng
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