Optimization of near-field scanning optical lithography

Title: Optimization of near-field scanning optical lithography
Creator: Routley, Ben S.; Holdsworth, John L.; Fleming, Andrew J.
Relation: Alternative Lithographic Technologies VII. Proceedings of the Conference on Alternative Lithographic Technologies VII [presented in Proceedings of SPIE, Vol. 9423] (San Jose, CA 23-26 February, 2015)
Publisher Link: http://dx.doi.org/10.1117/12.2086073
Publisher: Society of Photo-Optical Instrumentation Engineers (SPIE)
Resource Type: conference paper
Date: 2015
Description: This article describes two- and three-dimensional optical simulations for determining optimal conditions for near-field scanning optical lithography. It was found that a combination of 30-nm thick photoresist and 50-nm thick anti-reflective coating will yield optimal results with 405 nm incident light and a hollow-cantilever probe with 100-nm aperture width. In addition to identifying the optimal conditions, the sensitivity of the resolution with respect to each parameter is explored and plotted. The mechanisms behind each trend are described with supporting simulation data.
Subject: near-field scanning; optical lithography; simulation
Identifier: http://hdl.handle.net/1959.13/1340076
Identifier: uon:28395
Identifier: ISSN:0277-786X
Language: eng
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