- Title
- Deposition and characterization of Ti₂AlC MAX phase and Ti₃AlC thin films by magnetron sputtering
- Creator
- Su, Ranran; Zhang, Hongliang; O'Connor, D. J.; Shi, Liqun; Meng, Xiangpeng; Zhang, Haibin
- Relation
- Materials Letters Vol. 179, p. 194-197
- Publisher Link
- http://dx.doi.org/10.1016/j.matlet.2016.05.086
- Publisher
- Elsevier
- Resource Type
- journal article
- Date
- 2016
- Description
- We have deposited phase-pure Ti₂AlC and Ti₃AlC thin films directly on MgO (100) substrates by reactive radio frequency (RF) magnetron sputtering above 600 °C for the first time. As-deposited films were characterized with grazing incidence X-ray diffraction (GIXRD), Rutherford backscattering (RBS) and scanning electron microscope (SEM). Single-phase Ti₂AlC thin film could be synthesized above 600 °C. RBS results indicates a near-stoichiometric Ti₂AlC composition is required to prepare these phase-pure films. The films are polycrystalline and displayed arbitrarily oriented hexagonal laminal grains with lateral dimension varying from 150 nm to 400 nm for deposition temperatures ranging from 600 °C to 710 °C. The Perovskite phase Ti₃AlC was observed in the Ti₂AlC sample when the sputtering power is 90 W at 615 °C and a single-phase Ti₃AlC film was formed at 110 W.
- Subject
- thin films; Ti₂AIC; deposition; ceramics; Ti₃AIC
- Identifier
- http://hdl.handle.net/1959.13/1324850
- Identifier
- uon:25135
- Identifier
- ISSN:0167-577X
- Language
- eng
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