Your selections:
Iterative Deconvolution for Exposure Planning in Scanning Laser Lithography
- Ghalehbeygi, Omid T., O'Connor, John, Routley, Ben S., Fleming, Andrew J.
A nonlinear programming approach to exposure optimization in scanning laser lithography
- Fleming, Andrew J., Wills, Adrian, Ghalehbeygi, Omid T., Routley, Ben, Ninness, Brett
Exposure optimization in scanning laser lithography
- Fleming, Andrew J., Wills, Adrian G., Routley, Ben S.
A closed-loop phase-locked interferometer for wide bandwidth position sensing
- Fleming, Andrew J., Routley, Ben, Holdsworth, John L.
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